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Li diffusion in Ti oxyfluoride films: Thermal activation energy and jump length derived from impedance spectroscopy
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Materials Science.ORCID iD: 0000-0002-5496-9664
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Materials Science.ORCID iD: 0000-0002-8279-5163
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Materials Science.
1996 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 80, no 4, 2169-2174 p.Article in journal (Refereed) Published
Abstract [en]

Li ions were electrochemically intercalated into sputtered Ti oxyfluoride films. The process was found to be thermally activated with an activation energy depending on the amount of intercalated Li and decreasing with increasing Li content. The chemical diffusion coefficient was thermally activated as well with an activation energy of ∼0.5 eV independent of the amount of intercalated Li. The origin of the activation energy was discussed in terms of the Anderson–Stuart model. It was found likely that strain energy is needed to open up ‘‘doorways’’ in the Ti oxyfluoride structure to allow Li ion transport. The jump length for the Li ions inside the Ti oxyfluoride was estimated to lie in the 4–8 Å interval.

Place, publisher, year, edition, pages
1996. Vol. 80, no 4, 2169-2174 p.
National Category
Engineering and Technology
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URN: urn:nbn:se:uu:diva-30204DOI: 10.1063/1.363108OAI: oai:DiVA.org:uu-30204DiVA: diva2:58100
Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2017-12-06Bibliographically approved

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Strömme, MariaNiklasson, Gunnar A.Granqvist, Claes-Göran

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