High aspect ratio optical gratings in diamond
2013 (English)In: Diamond and related materials, ISSN 0925-9635, Vol. 34, 19-24 p.Article in journal (Refereed) Published
In this paper we describe a process for fabricating high aspect ratio gratings in single- or polycrystalline diamond with the high precision required by micro-optics. Nanoimprint lithography with a soft stamp and several layers of hard masks allowed for rapid and accurate replication of patterns written by e-beam or laser into thick Al masks on diamond substrates as large as 2 cm in diameter. Vertical sidewalls in the mask were crucial for avoiding microvilli formation during diamond plasma etching and were achieved by etching and oxidizing the Al mask in cycles. Circularly symmetric half-wave plates for wavelength bands around 4 and 11 mu m were fabricated with deep circular gratings on one side and antireflective gratings on the other.
Place, publisher, year, edition, pages
2013. Vol. 34, 19-24 p.
Reactive ion etching, synthetic diamond, plasma etching, grating, optics, interface structure
Manufacturing, Surface and Joining Technology Astronomy, Astrophysics and Cosmology
Research subject Engineering Science with specialization in Microsystems Technology
IdentifiersURN: urn:nbn:se:uu:diva-192561DOI: 10.1016/j.diamond.2013.01.009ISI: 000317795400004OAI: oai:DiVA.org:uu-192561DiVA: diva2:599976