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Dislocation emission at the silicon/silicon nitride interface: A million atom molecular dynamics simulation on parallel computers
Uppsala University, Interfaculty Units, För teknisk-naturvetenskapliga fakulteten gemensamma enheter, The Studsvik Neutron Research Laboratory.
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2000 (English)In: PHYSICAL REVIEW LETTERS, ISSN 0031-9007, Vol. 84, no 2, 322-325 p.Article in journal (Refereed) Published
Abstract [en]

Mechanical behavior of the Si(111)/Si3N4(0001) interface is studied using million atom molecular dynamics simulations, At a critical value of applied strain parallel to the interface, a crack forms on the silicon nitride surface and moves toward the inter

Place, publisher, year, edition, pages
AMERICAN PHYSICAL SOC , 2000. Vol. 84, no 2, 322-325 p.
Keyword [en]
SILICON-NITRIDE; FIRST-PRINCIPLES; FRACTURE; FILMS
Identifiers
URN: urn:nbn:se:uu:diva-36676OAI: oai:DiVA.org:uu-36676DiVA: diva2:64575
Note
Addresses: Bachlechner ME, Louisiana State Univ, Dept Phys & Astron, Concurrent Comp Lab Mat Simulat, Baton Rouge, LA 70803 USA. Louisiana State Univ, Dept Phys & Astron, Concurrent Comp Lab Mat Simulat, Baton Rouge, LA 70803 USA. Louisiana State Univ, DeAvailable from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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