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Chemical vapour deposition of molybdenum carbides: aspects of phase stability
Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Chemistry. Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Materials Chemistry, Inorganic Chemistry.
Uppsala University, Disciplinary Domain of Science and Technology, Physics, Department of Physics. Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Materials Chemistry, Inorganic Chemistry.
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2000 (English)In: THIN SOLID FILMS, ISSN 0040-6090, Vol. 370, no 1-2, 203-212 p.Article in journal (Refereed) Published
Abstract [en]

Thin films of different molybdenum carbides (delta-MoC1-x, gamma'-MoC1-x and Mo2C) have been deposited from a gas mixture of MoCl5/H-2/C2H4 at 800 degrees C by CVD. The H-2 content in the vapour has a strong influence on the phase composition and microstr

Place, publisher, year, edition, pages
2000. Vol. 370, no 1-2, 203-212 p.
Keyword [en]
molybdenum carbide; carbides; chemical vapor deposition
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-37030OAI: oai:DiVA.org:uu-37030DiVA: diva2:64929
Note
Addresses: Lu J, Univ Uppsala, Angstrom Lab, Dept Inorganic Chem, Box 538, S-75121 Uppsala, Sweden. Univ Uppsala, Angstrom Lab, Dept Inorgan Chem, S-75121 Uppsala, Sweden. Univ Uppsala, Dept Phys, Condensed Matter Theory Grp, S-75121 Uppsala, Sweden.Available from: 2007-06-28 Created: 2007-06-28 Last updated: 2012-03-29

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Eriksson, OlleNordström, LarsJansson, Ulf

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