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Sputter-deposited Ti oxide films used for photoelectrocatalytic degradation of 4-chlorophenol
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. SOLID STATE PHYSICS.
Chemistry, Department of Physical Chemistry.
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2001 (English)In: JOURNAL OF MATERIALS SCIENCE, ISSN 0022-2461, Vol. 36, no 15, 3699-3705 Language: English p.Article in journal (Refereed) Published
Abstract [en]

Ti oxide films were made by reactive magnetron sputtering under conditions yielding "penniform" structures with large porosity. X-ray diffractometry showed that rutile-like and anatase-like films were produced depending on the oxygen content in the sputte

Place, publisher, year, edition, pages
KLUWER ACADEMIC PUBL , 2001. Vol. 36, no 15, 3699-3705 Language: English p.
Keyword [en]
ELECTROCHEMICALLY ASSISTED PHOTOCATALYSIS; TITANIUM-DIOXIDE FILMS; THIN-FILMS; SEMICONDUCTOR PHOTOCATALYSIS; PREFERRED ORIENTATION; PHENOL; GAMMA-CD(OH)2; OXYFLUORIDE; ELECTRODES; IMPEDANCE
Identifiers
URN: urn:nbn:se:uu:diva-37284OAI: oai:DiVA.org:uu-37284DiVA: diva2:65183
Note
Addresses: Rodriguez J, Univ Nacl Ingn, Fac Ciencias, Av Tupac Amaru S-N, Casilla Postal 31-139, Lima, Peru. Uppsala Univ, Angstrom Lab, Dept Mat Sci, SE-75121 Uppsala, Sweden. Uppsala Univ, Dept Phys Chem, SE-75121 Uppsala, Sweden.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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