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Chemical bonding in carbon nitride films studied by X-ray spectroscopies
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science.
Physics, Department of Physics.
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2001 (English)In: DIAMOND AND RELATED MATERIALS, ISSN 0925-9635, Vol. 10, no 9-10, 1897-1900 Language: English p.Article in journal (Refereed) Published
Abstract [en]

Carbon nitride films are deposited using dc magnetron sputtering in a N-2 discharge. The nature of chemical bonding of the films is investigated using X-ray photoelectron spectroscopy, near-edge X-ray absorption fine structure, and X-ray emission spectros

Place, publisher, year, edition, pages
ELSEVIER SCIENCE SA , 2001. Vol. 10, no 9-10, 1897-1900 Language: English p.
Keyword [en]
carbon nitride film; chemical bonding; magnetron sputtering; X-ray spectroscopies; THIN-FILMS; ABSORPTION; TEMPERATURE; CNX
Identifiers
URN: urn:nbn:se:uu:diva-37329OAI: oai:DiVA.org:uu-37329DiVA: diva2:65228
Note
Addresses: Zheng WT, Jilin Univ, Dept Mat Sci, Changchun 130023, Peoples R China. Jilin Univ, Dept Mat Sci, Changchun 130023, Peoples R China. Jilin Univ, Natl Key Lab Superhard Mat, Changchun 130023, Peoples R China. Chiba Inst Technol, Dept Precis Engn,Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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