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Temperature dependent electrical resistivity in nanocrystalline gold films made by advanced gas deposition
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science.
2000 (English)In: JOURNAL OF APPLIED PHYSICS, ISSN 0021-8979, Vol. 88, no 11, 6578-6582 p.Article in journal (Refereed) Published
Abstract [en]

Nanocrystalline gold films were made by advanced gas deposition. The mean crystallite diameter lay between similar to 10 and similar to 80 nm depending on substrate temperature during deposition and annealing post-treatment, as found by x-ray diffractomet

Place, publisher, year, edition, pages
AMER INST PHYSICS , 2000. Vol. 88, no 11, 6578-6582 p.
Keyword [en]
NANOSTRUCTURED SILVER; METAL-FILMS; SCATTERING; RESISTANCE; CONDUCTION; ELECTRONS; DENSITY; ALLOYS; AG
Identifiers
URN: urn:nbn:se:uu:diva-37401OAI: oai:DiVA.org:uu-37401DiVA: diva2:65300
Note
Addresses: Ederth J, Uppsala Univ, Angstrom Lab, Dept Mat Sci, POB 534, SE-75121 Uppsala, Sweden. Uppsala Univ, Angstrom Lab, Dept Mat Sci, SE-75121 Uppsala, Sweden.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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