Surface roughness in sputtered SnO2 films studied by atomic force microscopy and spectroscopic light scattering
2000 (English)In: JOURNAL OF APPLIED PHYSICS, ISSN 0021-8979, Vol. 87, no 9, 4562-4571 p.Article in journal (Refereed) Published
In this paper we study the growth of surface roughness during sputtering of transparent SnO2 films onto rough glass substrates. Films in the thickness range 50-1200 nm were produced, and the optical characterization was made with a spectroscopic total int
Place, publisher, year, edition, pages
AMER INST PHYSICS , 2000. Vol. 87, no 9, 4562-4571 p.
THIN-FILMS; CROSS-CORRELATION; OXIDE-FILMS; TRANSMITTANCE MEASUREMENTS; OPTICAL-PROPERTIES; GROWTH; MULTILAYER; TIN; REFLECTANCE; EROSION
IdentifiersURN: urn:nbn:se:uu:diva-37437OAI: oai:DiVA.org:uu-37437DiVA: diva2:65336
Addresses: Niklasson GA, Uppsala Univ, Angstrom Lab, Dept Mat Sci, POB 534, SE-75121 Uppsala, Sweden. Uppsala Univ, Angstrom Lab, Dept Mat Sci, SE-75121 Uppsala, Sweden.2008-10-172008-10-172011-01-14