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Surface roughness in sputtered SnO2 films studied by atomic force microscopy and spectroscopic light scattering
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science.
2000 (English)In: JOURNAL OF APPLIED PHYSICS, ISSN 0021-8979, Vol. 87, no 9, 4562-4571 p.Article in journal (Refereed) Published
Abstract [en]

In this paper we study the growth of surface roughness during sputtering of transparent SnO2 films onto rough glass substrates. Films in the thickness range 50-1200 nm were produced, and the optical characterization was made with a spectroscopic total int

Place, publisher, year, edition, pages
AMER INST PHYSICS , 2000. Vol. 87, no 9, 4562-4571 p.
Keyword [en]
THIN-FILMS; CROSS-CORRELATION; OXIDE-FILMS; TRANSMITTANCE MEASUREMENTS; OPTICAL-PROPERTIES; GROWTH; MULTILAYER; TIN; REFLECTANCE; EROSION
Identifiers
URN: urn:nbn:se:uu:diva-37437OAI: oai:DiVA.org:uu-37437DiVA: diva2:65336
Note
Addresses: Niklasson GA, Uppsala Univ, Angstrom Lab, Dept Mat Sci, POB 534, SE-75121 Uppsala, Sweden. Uppsala Univ, Angstrom Lab, Dept Mat Sci, SE-75121 Uppsala, Sweden.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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