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Epitaxial growth of Bi4Ti3O12 on alpha-Al2O3(012) substrates by CVD using metal chloride precursors
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Chemistry.
2000 (English)In: CHEMICAL VAPOR DEPOSITION, ISSN 0948-1907, Vol. 6, no 4, 177-180 p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
WILEY-V C H VERLAG GMBH , 2000. Vol. 6, no 4, 177-180 p.
Keyword [en]
CHEMICAL-VAPOR-DEPOSITION; BISMUTH TITANATE; THIN-FILMS; PHASE
Identifiers
URN: urn:nbn:se:uu:diva-37602OAI: oai:DiVA.org:uu-37602DiVA: diva2:65501
Note
Addresses: Schuisky M, Univ Uppsala, Angstrom Lab, Dept Inorgan Chem, Box 538, SE-75121 Uppsala, Sweden. Univ Uppsala, Angstrom Lab, Dept Inorgan Chem, SE-75121 Uppsala, Sweden.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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