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Chemical vapour deposition of molybdenum carbides: aspects of nanocrystallinity
oorganisk kemi.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
2001 (English)In: THIN SOLID FILMS, ISSN 0040-6090, Vol. 396, no 1-2, 53-61 p.Article in journal (Refereed) Published
Abstract [en]

Nanocrystalline films of delta -MoC1-x have been deposited from a MoCl5/H-2/C2H4 mixture at 800 degreesC and a total pressure of 1.7 torr. The average grain size, free carbon content and the deposition rate were affected by different experimental paramete

Place, publisher, year, edition, pages
2001. Vol. 396, no 1-2, 53-61 p.
Keyword [en]
chemical vapour deposition (CVD); nanocrystalline structure; transmission electron microscopy (TEM); carbide; POWDERS; GROWTH
National Category
Inorganic Chemistry
Identifiers
URN: urn:nbn:se:uu:diva-37654OAI: oai:DiVA.org:uu-37654DiVA: diva2:65553
Note
Addresses: Univ Uppsala, Dept Inorgan Chem, POB 538, S-75121 Uppsala, Sweden. Univ Uppsala, Dept Inorgan Chem, S-75121 Uppsala, Sweden.Available from: 2005-10-19 Created: 2005-10-19 Last updated: 2011-01-14

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