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Control of crystallinity in sputtered Cr-Ti-C films
Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Chemistry - Ångström, Inorganic Chemistry.
Uppsala University, Disciplinary Domain of Science and Technology, Chemistry, Department of Chemistry - Ångström, Inorganic Chemistry.
2013 (English)In: Acta Materialia, ISSN 1359-6454, E-ISSN 1873-2453, Vol. 61, no 17, 6352-6361 p.Article in journal (Refereed) Published
Abstract [en]

The influence of Ti content on crystallinity and bonding of Cr-Ti-C thin films deposited by magnetron sputtering have been studied by X-ray diffraction, X-ray photoelectron spectroscopy, transmission electron microscopy and Raman spectroscopy. Our results show that binary Cr-C films without Ti exhibit an amorphous structure with two non-crystalline components; amorphous CrCx, and amorphous C (a-C). The addition of 10-20 at.% Ti leads to the crystallization of the amorphous CrCx and the formation of a metastable cubic (Cr1-xTix)Cy phase. The observation was explained based on the tendency of the 3d transition metals to form crystalline carbide films. The mechanical properties of the films determined by nanoindentation and microindentation were found to be strongly dependent on the film composition in terms of hardness, elasticity modulus, hardness/elasticity ratio and crack development.

Place, publisher, year, edition, pages
2013. Vol. 61, no 17, 6352-6361 p.
Keyword [en]
Carbides, Thin films, Crystallization, Amorphous alloy, Sputtering
National Category
Natural Sciences
Identifiers
URN: urn:nbn:se:uu:diva-209457DOI: 10.1016/j.actamat.2013.06.045ISI: 000324791700003OAI: oai:DiVA.org:uu-209457DiVA: diva2:659128
Available from: 2013-10-24 Created: 2013-10-21 Last updated: 2017-12-06Bibliographically approved

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Jansson, Ulf

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