Chemical vapor deposition of ordered TiOx nanostructures on Au(111)
2013 (English)In: Surface Science, ISSN 0039-6028, E-ISSN 1879-2758, Vol. 617, 211-217 p.Article in journal (Refereed) Published
The deposition of TiOx (x <= 2) structures on Au(111) by chemical vapor deposition (CVD) in ultrahigh vacuum (UHV) has been investigated with high-resolution core level photoelectron spectroscopy (PES), low-energy electron diffraction (LEED) and scanning tunneling microscopy (STM). Using titanium tetra-isopropoxide as single source precursor it is possible to form different TiOx phases on the surface after deposition: at low coverages, we observe large two-dimensional (2D) honeycomb-lattice Ti2O3 islands with a (2 x 2) registry with the substrate. Higher coverages are dominated by the formation of three-dimensional (3D) TiO2 structures. The TiO2 structures are atomically well ordered provided that the deposition temperature is high enough (500 degrees C). The ordered structure exhibits a LEED pattern characteristic for a rectangular surface unit cell. By performing the deposition at different temperatures it is possible to tune the balance between the 2D and 3D phases: Growth at 500 degrees C significantly favors the formation of 3D TiO2 islands as compared to growth at 200 degrees C and 300 degrees C.
Place, publisher, year, edition, pages
2013. Vol. 617, 211-217 p.
Titanium dioxide, Gold, Chemical vapor deposition, Synchrotron radiation photoelectron spectroscopy, Low-energy electron diffraction, Scanning tunneling microscopy
IdentifiersURN: urn:nbn:se:uu:diva-211444DOI: 10.1016/j.susc.2013.07.019ISI: 000326141100031OAI: oai:DiVA.org:uu-211444DiVA: diva2:667593