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Atomic layer deposition of tantalum oxide thin films from iodide precursor
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Chemistry. Department of Materials Chemistry, Inorganic Chemistry.
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2001 (English)In: Chem. Mater., Vol. 13, 122- p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
2001. Vol. 13, 122- p.
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Inorganic Chemistry
URN: urn:nbn:se:uu:diva-39230OAI: oai:DiVA.org:uu-39230DiVA: diva2:67129
Available from: 2005-10-19 Created: 2005-10-19 Last updated: 2011-01-14

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Hårsta, Anders
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Department of ChemistryInorganic Chemistry
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