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Atomic layer deposition of titanium oxide from TiI4 and H2O2
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Chemistry. Department of Materials Chemistry, Inorganic Chemistry.
Department of Materials Chemistry, Inorganic Chemistry.
Department of Materials Chemistry, Inorganic Chemistry.
Department of Materials Chemistry, Inorganic Chemistry.
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2000 (English)In: Chem. Vap. Deposition, Vol. 6, 303- p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
2000. Vol. 6, 303- p.
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Inorganic Chemistry
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URN: urn:nbn:se:uu:diva-39243OAI: oai:DiVA.org:uu-39243DiVA: diva2:67142
Available from: 2008-09-24 Created: 2008-09-24 Last updated: 2011-01-14

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Hårsta, Anders

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