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Ultra thin TiO2 films deposited by atomic layer chemical vapor deposition
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Chemistry.
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2000 (English)In: Chemical Vapor Deposition, Fifteenth Int. Conf., 2000, 637- p.Conference paper, Published paper (Refereed)
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2000. 637- p.
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URN: urn:nbn:se:uu:diva-39244OAI: oai:DiVA.org:uu-39244DiVA: diva2:67143
Available from: 2008-06-09 Created: 2008-06-09

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Hårsta, A

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