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Characterisation of Ta2O5 films prepared by ALCVD
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Chemistry.
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2000 (English)In: Chemical Vapor Deposition, Fifteenth Int. Conf., 2000, 645- p.Conference paper (Refereed)
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2000. 645- p.
URN: urn:nbn:se:uu:diva-39245OAI: oai:DiVA.org:uu-39245DiVA: diva2:67144
Available from: 2008-05-21 Created: 2008-05-21

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Sundqvist, JHårsta, A
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