Microfluidics integrable plasma source powered by a silicon through-substrate split-ring resonator
2013 (English)In: Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS EUROSENSORS XXVII), 2013, 2608-2611 p.Conference paper, Presentation (Other academic)
A novel microplasma source, based on a microstrip split-ring resonator design with electrodes integrated in its silicon substrate, was designed, manufactured and evaluated. This device should offer straightforward integration with other MEMS components, and has a plasma discharge gap with a controlled volume and geometry, with potential for microfluidics. Two realized devices were resonant at around 2.9 GHz with quality factors of 26.6 and 18.7. Two different plasma ignition modes were observed, where the plasma at low pressures was not confined to the gap but rather appeared between the ends of the electrodes on the backside.
Place, publisher, year, edition, pages
2013. 2608-2611 p.
elemental semiconductors, ignition, microfluidics, micromechanical resonators, microstrip resonators, plasma instability, plasma pressure, plasma sources;silicon, MEMS, Si, microfluidics integrable plasma source, plasma discharge gap, plasma ignition modes, quality factors, silicon through-substrate split-ring resonator, Electrodes, Microstrip, Nickel, Optical resonators, Plasma sources, Substrates, Micro-fluidics, Microplasma source, Ni plating, RF, Split-ring resonator
Other Physics Topics Engineering and Technology
Research subject Engineering Science with specialization in Microsystems Technology; Engineering Science with specialization in Microwave Technology
IdentifiersURN: urn:nbn:se:uu:diva-212362DOI: 10.1109/Transducers.2013.6627340OAI: oai:DiVA.org:uu-212362DiVA: diva2:677262
2013 Transducers Eurosensors XXVII: The 17th International Conference on