Deposition and characterization of reactive magnetron sputtered zirconium carbide films
2013 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 232, 876-883 p.Article in journal (Refereed) Published
Zirconium carbide films have been deposited on silicon (100) substrates using direct current magnetron reactive sputtering using CH4 as a carbon source. The films exhibit a typical nanocomposite structure consisting of nanocrystalline ZrCx (nc-ZrC) grains embedded in a matrix of amorphous carbon (a-C) at low carbon content. Almost no crystalline phase can be found for carbon contents above 86 at.%. The mechanical, tribological and electrical properties of the films showed a significant dependency on the amount of the a-C in the nanocomposite structure. A larger amount of a-C gives rise to reduced hardness and higher resistivity of the film. However, both friction coefficient and wear resistance are improved by increasing the content of the surplus a-C. The influence of binding state of excess a-C phase on the properties has also been investigated. A larger sp(2)/sp(3) ratio was beneficial to relax the stress and improve the electrical properties. The Zr-based films exhibited lower friction coefficients than nanocomposites films based on e.g. Ti suggesting a potential application for this material in sliding contacts.
Place, publisher, year, edition, pages
2013. Vol. 232, 876-883 p.
Zirconium carbide, Mechanical properties, Friction and wear, Electrical resistivity, Magnetron sputtering
IdentifiersURN: urn:nbn:se:uu:diva-214005DOI: 10.1016/j.surfcoat.2013.06.116ISI: 000327691300113OAI: oai:DiVA.org:uu-214005DiVA: diva2:683797