A theoretical study of possible point defects incorporated into alpha-alumina deposited by chemical vapor deposition
2013 (English)In: Theoretical Chemistry accounts, ISSN 1432-881X, E-ISSN 1432-2234, Vol. 133, no 2, 1433- p.Article in journal (Refereed) Published
The energetics and electronic structure of carbon, chlorine, hydrogen, and sulfur in alpha-Al2O3 was investigated by first principles and thermodynamical calculations. These species are present in the gas phase during the synthesis of alpha-Al2O3 by chemical vapor deposition (CVD) but little is known of their solubility in this compound. The heat of formation from standard reference states of the elements varying the chemical potential of each element was calculated. An attempt to model the actual conditions in the CVD process was made, using the species and solid compounds present in a common CVD process as reference states. Our calculations suggest that sulfur from the catalyzing agent H2S will not solve in alpha-Al2O3 during deposition by CVD. It is found that the neutral chlorine and hydrogen interstitial defects display the lowest heat of formation, 281 and 280 kJ/mol, respectively, at the modeled CVD conditions. This energy is too high in order for neutral defects to form during CVD of alpha-Al2O3 at any significant amounts. The charged defects and their compensation were studied. Carbon substituting oxygen is found to be energetically favored under the modeled CVD conditions, considering carbon dioxide as competing species to solid solubility in alpha-Al2O3 at an energy of -128 kJ/mol. However, care needs to be taken when choosing the possible competing carbon-containing phases. Compensation of carbon substituting for oxygen by oxygen vacancies takes place at 110 kJ/mol from standard reference states, graphite, fcc-Al and O-2. The carbon solubility in Al2O3 is difficult to measure with standard analysis techniques such as X-ray diffraction and energy dispersive X-ray spectroscopy, but several stable compounds in the Al-C-O are available in the literature.
Place, publisher, year, edition, pages
2013. Vol. 133, no 2, 1433- p.
Alumina, CVD, Carbon, Chlorine, Hydrogen, Sulfur, Ab initio
Natural Sciences Engineering and Technology
Research subject Engineering Science with specialization in Materials Science
IdentifiersURN: urn:nbn:se:uu:diva-216740DOI: 10.1007/s00214-013-1433-xISI: 000329115900001OAI: oai:DiVA.org:uu-216740DiVA: diva2:691164
Published as part of a special collection of articles focusing on chemical vapor deposition and atomic layer deposition.2014-01-272014-01-242014-10-23Bibliographically approved