HiPIMS deposition of TiOx in an industrial-scale apparatus: Effects of target size and deposition geometry on hysteresis
2013 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 235, 714-719 p.Article in journal (Refereed) Published
High power impulse magnetron sputtering (HiPIMS) has proven its potential for improvement of properties of deposited coatings. Yet, up-scaling of processes into large industrial-scale systems needs investigation. Hereby we report reactive HiPIMS of titanium dioxide thin films carried out in a cubic meter large deposition chamber using a 30.5 x 12.5 cm(2) titanium target sputtered in Ar/O-2 gas atmosphere. The effect of the pulsing frequency at constant average power (2 kW) has been studied. A significant reduction of hysteresis was observed for pulsing frequencies as low as 200 Hz, confirming previous studies. Finally, data from X-ray diffraction indicate that the phase constitution of the HiPIMS-deposited coatings evolves from an anatase/rutile mixture to rutile as the pulse frequency is decreased. (C) 2013 Elsevier B.V. All rights reserved.
Place, publisher, year, edition, pages
2013. Vol. 235, 714-719 p.
High power impulse magnetron sputtering, Reactive sputtering, Titanium oxide, Hysteresis, Industrial-scale deposition apparatus
Engineering and Technology
IdentifiersURN: urn:nbn:se:uu:diva-218333DOI: 10.1016/j.surfcoat.2013.08.053ISI: 000329596100090OAI: oai:DiVA.org:uu-218333DiVA: diva2:695827