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HiPIMS deposition of TiOx in an industrial-scale apparatus: Effects of target size and deposition geometry on hysteresis
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
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2013 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 235, 714-719 p.Article in journal (Refereed) Published
Abstract [en]

High power impulse magnetron sputtering (HiPIMS) has proven its potential for improvement of properties of deposited coatings. Yet, up-scaling of processes into large industrial-scale systems needs investigation. Hereby we report reactive HiPIMS of titanium dioxide thin films carried out in a cubic meter large deposition chamber using a 30.5 x 12.5 cm(2) titanium target sputtered in Ar/O-2 gas atmosphere. The effect of the pulsing frequency at constant average power (2 kW) has been studied. A significant reduction of hysteresis was observed for pulsing frequencies as low as 200 Hz, confirming previous studies. Finally, data from X-ray diffraction indicate that the phase constitution of the HiPIMS-deposited coatings evolves from an anatase/rutile mixture to rutile as the pulse frequency is decreased. (C) 2013 Elsevier B.V. All rights reserved.

Place, publisher, year, edition, pages
2013. Vol. 235, 714-719 p.
Keyword [en]
High power impulse magnetron sputtering, Reactive sputtering, Titanium oxide, Hysteresis, Industrial-scale deposition apparatus
National Category
Engineering and Technology
URN: urn:nbn:se:uu:diva-218333DOI: 10.1016/j.surfcoat.2013.08.053ISI: 000329596100090OAI: oai:DiVA.org:uu-218333DiVA: diva2:695827
Available from: 2014-02-12 Created: 2014-02-11 Last updated: 2014-02-12Bibliographically approved

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Kubart, Tomas
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