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Stability of halogen-terminated diamond (111) surfaces
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Physics, Department of Quantum Chemistry.
1997 (English)In: JOURNAL OF PHYSICAL CHEMISTRY A, ISSN 1089-5639, Vol. 101, no 1, 76-82 p.Article in journal (Other scientific) Published
Abstract [en]

The adsorption of the different species X and CX(3) on an X-terminated diamond (111) surface (X = H, F,Cl, Br) has been investigated structurally and energetically, using a cluster approach and two different types of quantum mechanical methods: the ab ini

Place, publisher, year, edition, pages
1997. Vol. 101, no 1, 76-82 p.
Keyword [en]
CHEMICAL-VAPOR-DEPOSITION; AB-INITIO; POLYATOMIC-MOLECULES; GROWTH; ADSORPTION; HYDROGEN; METHYL; ERRORS; PHASE; CVD
Identifiers
URN: urn:nbn:se:uu:diva-41708OAI: oai:DiVA.org:uu-41708DiVA: diva2:69609
Note
Larsson K, UPPSALA UNIV, INST CHEM, BOX 531, S-75121 UPPSALA, SWEDEN. UNIV UPPSALA, DEPT QUANTUM CHEM, S-75120 UPPSALA, SWEDEN.Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-15

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