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Influence of thickness and growth temperature on the properties of zirconium oxide films grown by atomic layer deposition on silicon
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2002 (English)In: Thin Solid Films, no 410, 53-60 p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
2002. no 410, 53-60 p.
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Inorganic Chemistry
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URN: urn:nbn:se:uu:diva-42149OAI: oai:DiVA.org:uu-42149DiVA: diva2:70050
Available from: 2005-11-29 Created: 2005-11-29 Last updated: 2011-01-13

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Hårsta, Anders

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