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Formation and behavior of ceramic layer by ion-deposited Ti coating using FMEVAD and Ti and C dual implantation
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Materials Science. IONPHYSICS.
2001 (English)In: Nucl. Inst. and Meth., Vol. 184, 509-514 p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
2001. Vol. 184, 509-514 p.
URN: urn:nbn:se:uu:diva-42357OAI: oai:DiVA.org:uu-42357DiVA: diva2:70258
Available from: 2008-10-17 Created: 2008-10-17 Last updated: 2011-01-14

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