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Hafnium tetraiodide and oxygen as precursors for atomic layer deposition of hafnium oxide thin films
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. oorganisk kemi.
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2002 (English)In: Thin Solid Films, Vol. 418, 69-72 p.Article in journal (Refereed) Published
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2002. Vol. 418, 69-72 p.
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Inorganic Chemistry
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URN: urn:nbn:se:uu:diva-42460OAI: oai:DiVA.org:uu-42460DiVA: diva2:70362
Available from: 2008-09-22 Created: 2008-09-22 Last updated: 2011-01-13

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Hårsta, Anders

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