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Investigation of ALCVD TM TiN/Al2O3/HfAlOx/Al2O3 stack on epitaxial Si and Si0.7Ge0.3
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2002 (English)In: IEEE SISC, December, 2002Conference paper, Published paper (Refereed)
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2002.
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Other Electrical Engineering, Electronic Engineering, Information Engineering
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URN: urn:nbn:se:uu:diva-42640OAI: oai:DiVA.org:uu-42640DiVA: diva2:70542
Available from: 2007-02-26 Created: 2007-02-26

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Sjöblom, GustafOlsson, JörgenBlom, Hans-Olof

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