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Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
2014 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 238, 152-157 p.Article in journal (Refereed) Published
Abstract [en]

Ionized metal flux fractions in high power impulse magnetron sputtering (HiPIMS) were analyzed by a combination of a retarding field analyzer and a quartz crystal microbalance (QCM). Two target materials, Ni and Ti, were studied in an Ar atmosphere. In the case of Ti, the reactive (Ar + O-2) mode was also investigated. Ionized metal flux fractions of up to 50% for Ni were observed at a pulse power density of 1 kW cm(-2). The pulse on-time had negligible influence on the ionized fraction. Somewhat higher values, exceeding 60%, were measured for Ti at 2 kW cm(-2). In this case, shorter on-times led to higher ionized fractions at the same deposition rate and average discharge power density. In reactive sputtering of Ti, substantially higher ionized fraction was observed in the oxide mode as compared to the metal mode. Already at lower values of the pulse power, there was a significant fraction of Ti ions in the flux.

Place, publisher, year, edition, pages
2014. Vol. 238, 152-157 p.
Keyword [en]
HiPIMS, Reactive sputtering, Ionized flux fraction
National Category
Engineering and Technology
Research subject
Engineering Science with specialization in Electronics
Identifiers
URN: urn:nbn:se:uu:diva-220818DOI: 10.1016/j.surfcoat.2013.10.064ISI: 000331028200018OAI: oai:DiVA.org:uu-220818DiVA: diva2:706516
Available from: 2014-03-20 Created: 2014-03-20 Last updated: 2017-12-05Bibliographically approved

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Kubart, Tomas

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