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Sharp Reduction of Contact Resistivities by Effective Schottky Barrier Lowering with Silicides as Diffusion Sources
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
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2010 (English)In: IEEE Electron Device Letters, ISSN 0741-3106, E-ISSN 1558-0563, Vol. 31, 731-733 p.Article in journal (Refereed) Published
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2010. Vol. 31, 731-733 p.
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Engineering and Technology
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URN: urn:nbn:se:uu:diva-222361OAI: oai:DiVA.org:uu-222361DiVA: diva2:711534
Available from: 2014-04-10 Created: 2014-04-10 Last updated: 2017-12-05

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Zhen, Zhang

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