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Exploitation of a self-limiting process for reproducible formation of ultrathin Ni1−xPtx silicide films
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
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2010 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 97, 252108- p.Article in journal, Letter (Refereed) Published
Place, publisher, year, edition, pages
2010. Vol. 97, 252108- p.
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Engineering and Technology
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URN: urn:nbn:se:uu:diva-222460OAI: oai:DiVA.org:uu-222460DiVA: diva2:711661
Available from: 2014-04-10 Created: 2014-04-10 Last updated: 2017-12-05

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Zhen, Zhang

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