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Interaction of NiSi with dopants for metallic source/drain applications
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
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2010 (English)In: Journal of Vacuum Science & Technology B, ISSN 1071-1023, E-ISSN 1520-8567, Vol. 28, 1071- p.Article in journal, Letter (Refereed) Published
Place, publisher, year, edition, pages
2010. Vol. 28, 1071- p.
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Engineering and Technology
URN: urn:nbn:se:uu:diva-222464OAI: oai:DiVA.org:uu-222464DiVA: diva2:711666
Available from: 2014-04-10 Created: 2014-04-10 Last updated: 2016-04-19

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Zhen, ZhangZhang, Shi-Li
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