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Silicide Contact Resistivity and Phase Formation for Extremely Scaled CMOS Device Applications
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
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2012 (English)Conference paper, Abstract (Refereed)
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Engineering and Technology
URN: urn:nbn:se:uu:diva-222468OAI: oai:DiVA.org:uu-222468DiVA: diva2:711670
Materials Research Society (MRS) 2012 Spring meeting
Available from: 2014-04-10 Created: 2014-04-10 Last updated: 2014-04-10

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Zhen, Zhang
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Solid State Electronics
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