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Atomic layer deposition of thin film laminates and solid solutions – the case of zinc tin oxide
Stanford University.ORCID iD: 0000-0001-6589-3514
ION-TOF GmbH.
Stanford University.
Stanford University.
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2013 (English)Conference paper, Oral presentation only (Refereed)
Place, publisher, year, edition, pages
San Diego, CA: American Vacuum Society (AVS) , 2013.
Keyword [en]
atomic layer deposition, thin films, semiconductors, spectroscopic ellipsometry, low energy ion scattering (LEIS)
National Category
Chemical Engineering Materials Engineering Condensed Matter Physics
Identifiers
URN: urn:nbn:se:uu:diva-222496OAI: oai:DiVA.org:uu-222496DiVA: diva2:711779
Conference
ALD 2013 - 13th international conference on atomic layer deposition
Available from: 2014-04-11 Created: 2014-04-11 Last updated: 2017-01-25

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Hägglund, Carl

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Chemical EngineeringMaterials EngineeringCondensed Matter Physics

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