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Effective Schottky Barrier Lowering for Contact Resistivity Reduction Using Silicides as Diffusion Sources
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
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2010 (English)Conference paper, Published paper (Refereed)
Place, publisher, year, edition, pages
2010.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-222535OAI: oai:DiVA.org:uu-222535DiVA: diva2:711821
Conference
Proc. International Symposium on VLSI Technology, System and Applications (VLSI-TSA)
Available from: 2014-04-11 Created: 2014-04-11 Last updated: 2014-04-11

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Zhen, Zhang

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CiteExportLink to record
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Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
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Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
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Output format
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