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Atomic Layer Deposition of Polycrystalline HfO2 Films by the HfI4-O2 Precursor Combination.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry. Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry, Inorganic Chemistry. oorganisk kemi.
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2003 (English)In: Thin Solid Films, no 427, 147-151 p.Article in journal (Refereed) Published
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2003. no 427, 147-151 p.
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Inorganic Chemistry
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URN: urn:nbn:se:uu:diva-43854OAI: oai:DiVA.org:uu-43854DiVA: diva2:71759
Available from: 2006-03-21 Created: 2006-03-21 Last updated: 2011-01-13

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