Upgrading the “Berg-model” for reactive sputtering processes
2014 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 565, 186-192 p.Article, review/survey (Refereed) Published
Several phenomena are neglected in the original “Berg model” in order to provide a simple model of the reactive sputtering process. There exist situations, however, where this simplified treatment limits the usefulness of the model. To partly correct for this, we introduce an upgraded version of the basic model. We abandon the simplifying assumption that compound targets are sputter eroded as molecules. Instead, the molecule is split and individual atoms will be sputter ejected. Also, the effect of ionized reactive gas atoms implanted into the target will be considered. We outline how to modify the original model to include these effects. Still, the mathematical treatment is maintained simple so that the new model may serve as an easy-to-understand tutorial of the complex mechanisms of reactive sputtering.
Place, publisher, year, edition, pages
2014. Vol. 565, 186-192 p.
Reactive sputtering, Hysteresis, Modelling
Other Physics Topics Engineering and Technology
Research subject Engineering Science with specialization in Electronics
IdentifiersURN: urn:nbn:se:uu:diva-229204DOI: 10.1016/j.tsf.2014.02.063ISI: 000341054600030OAI: oai:DiVA.org:uu-229204DiVA: diva2:736169
FunderSwedish Foundation for Strategic Research