Graphene as a Diffusion Barrier in Galinstan-Solid Metal Contacts
2014 (English)In: IEEE Transactions on Electron Devices, ISSN 0018-9383, Vol. 61, no 8, 2996-3000 p.Article in journal (Refereed) Published
This paper presents the use of graphene as a diffusion barrier to a eutectic Ga-In-Sn alloy, i.e., galinstan, for electrical contacts in electronics. Galinstan is known to be incompatible with many conventional metals used for electrical contacts. When galinstan is in direct contact with Al thin films, Al is readily dissolved leading to the formation of Al oxides present on the surface of the galinstan droplets. This reaction is monitored ex situ using several material analysis methods as well as in situ using a simple circuit to follow the time-dependent resistance variation. In the presence of a multilayer graphene diffusion barrier, the Al-galinstan reaction is effectively prevented for galinstan deposited by means of drop casting. When deposited by spray coating, the high-impact momentum of the galinstan droplets causes damage to the multilayer graphene and the Al-galinstan reaction is observed at some defective spots. Nonetheless, the graphene barrier is likely to block the formation of Al oxides at the Al/galinstan interface leading to a stable electrical current in the test circuit.
Place, publisher, year, edition, pages
2014. Vol. 61, no 8, 2996-3000 p.
Other Electrical Engineering, Electronic Engineering, Information Engineering Nano Technology
Research subject Engineering Science with specialization in Electronics; Engineering Science with specialization in Microsystems Technology
IdentifiersURN: urn:nbn:se:uu:diva-229503DOI: 10.1109/TED.2014.2331893ISI: 000342906200056OAI: oai:DiVA.org:uu-229503DiVA: diva2:736871