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Increasing the carbon deposition rate using sputter yield amplification upon serial magnetron co-sputtering
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2014 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 252, 74-78 p.Article in journal (Refereed) Published
Abstract [en]

Deposition of carbon based materials by magnetron sputtering suffers frequently from the low deposition rate of carbon due to its low sputtering yield. Here, we describe an approach based on the so-called sputtering yield amplification, which significantly increases the sputtering yield. Carbon has been doped by serial co-sputtering with two different elements, namely tungsten and niobium. Both elements provide a significant rate increase. Addition of 3 at.% of Nb increases the deposition rate of carbon by 130%, whereas the same concentration of W increases it by 280%. TRIDYN simulations have been performed, which reproduce the experimental data. Additionally, our experiments find evidence for very long residence times of the dopant in the target as a result of recoil implantation.  

Place, publisher, year, edition, pages
2014. Vol. 252, 74-78 p.
Keyword [en]
Carbon, Magnetron sputtering, Serial co-sputtering, Deposition rate, Sputter yield amplification, TRIDYN
National Category
Materials Engineering
Research subject
Engineering Science with specialization in Electronics
URN: urn:nbn:se:uu:diva-229703DOI: 10.1016/j.surfcoat.2014.04.067ISI: 000338620100009OAI: oai:DiVA.org:uu-229703DiVA: diva2:738550
Available from: 2014-08-18 Created: 2014-08-12 Last updated: 2014-10-06Bibliographically approved

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Kubart, Tomas
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Solid State Electronics
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