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ALD metal-gate/high-k gate stack for Si and Si0.7Ge0.3 surface-channel pMOSFETs
Uppsala University, Medicinska vetenskapsområdet, Faculty of Pharmacy, Department of Medicinal Chemistry. Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics.
Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences. Teknisk-naturvetenskapliga vetenskapsområdet, Technology, Department of Engineering Sciences, Electronics. Fasta tillståndets elektronik.
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2003 (English)In: Proceedings of 33th ESSDERC2003, 2003, 263-266 p.Conference paper, Published paper (Refereed)
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2003. 263-266 p.
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Other Electrical Engineering, Electronic Engineering, Information Engineering
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URN: urn:nbn:se:uu:diva-46459OAI: oai:DiVA.org:uu-46459DiVA: diva2:74366
Available from: 2007-02-23 Created: 2007-02-23

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Sjöblom, GustafOlsson, Jörgen

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