Characterizing the focus of a multilayer coated off-axis parabola for FLASH beam at lambda = 4.3 nm
2013 (English)Conference paper (Refereed)
A super-polished substrate with an off-axis parabola figure was coated with a Sc/B4C/Cr multilayer. This optic was used to focus pulses of 4.3 nm photons from the Free-electron LASer in Hamburg (FLASH) at normal incidence. Beam imprints were made in poly(methyl methacrylate) to align the optic and to measure the beam profile at the focal plane. The intense interaction resulted in imprints with raised perimeters, surrounded by ablated material extending out several micrometres. These features interfere with the beam profile measurement. The effect of a post-exposure development step on the beam imprints was investigated.
Place, publisher, year, edition, pages
2013. Vol. 8777, 87770-87770 p.
Atom and Molecular Physics and Optics
IdentifiersURN: urn:nbn:se:uu:diva-232852DOI: 10.1117/12.2022403OAI: oai:DiVA.org:uu-232852DiVA: diva2:750002
Proc. SPIE 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics