Characterization of amorphous Zr-Si-C thin films deposited by DC magnetron sputtering
2015 (English)In: Surface & Coatings Technology, ISSN 0257-8972, E-ISSN 1879-3347, Vol. 261, 227-234 p.Article in journal (Refereed) Published
Zr-x(SiyC1-y)(1-x) films with different Si/C atomic ratios and Zr contents were deposited using non-reactive dc-magnetron co-sputtering. All films exhibited an X-ray amorphous structure with a complex distribution of chemical bonds. The presence of Zr in the films reduced the amount of C-C and Si-C bonds but favored the formation of Zr-C and Zr-Si bonds. The mechanical and electrical properties were dependent on the bond distribution in the amorphous structure and a linear relationship between film hardness and the relative amount of Si-C bonds was observed. The addition of Zr in films also gave rise to an increase in metallic character resulting in a lower electrical resistivity. Analysis of the tribofilm showed that a low friction coefficient was favored by the formation of a lubricating a-C layer and that the formation of zirconium and silicon oxides in the more Zr-rich films has a detrimental effect on the tribological performance. (C) 2014 Elsevier B.V. All rights reserved.
Place, publisher, year, edition, pages
2015. Vol. 261, 227-234 p.
Zirconium silicon carbide, Chemical bond structure, Mechanical properties, Tribofilm, Electrical resistivity
Other Chemistry Topics
IdentifiersURN: urn:nbn:se:uu:diva-245365DOI: 10.1016/j.surfcoat.2014.11.024ISI: 000348255500031OAI: oai:DiVA.org:uu-245365DiVA: diva2:791156