Evaluation of dielectric properties of HTCC alumina for realization of plasma sources
2015 (English)In: Journal of Electronic Materials, ISSN 0361-5235, E-ISSN 1543-186X, Vol. 44, no 10, 3654-3660 p.Article in journal (Refereed) Published
As the sensitivity of optogalvanic spectroscopy based on prototype microplasma sources increases, contamination from composite materials in the printed circuit board used starts to become a concern. In this paper, a transfer to high-temperature cofired alumina and platinum is made and evaluated. The high-purity alumina provides an inert plasma environment, and allows for temperatures above 1000A degrees C, which is beneficial for future integration of a combustor. To facilitate the design of high-end plasma sources, characterization of the radio frequency (RF) parameters of the materials around 2.6 GHz is carried out. A RF resonator structure was fabricated in both microstrip and stripline configurations. These resonators were geometrically and electrically characterized, and epsilon (r) and tan were calculated using the RF waveguide design tool Wcalc. The resulting epsilon (r) for the microstrip and stripline was found to be 10.68 (+/- 0.12) and 9.65 (+/- 0.14), respectively. The average tan of all devices was found to be 0.0011 (+/- 0.0007). With these parameters, a series of proof-of-concept plasma sources were fabricated and evaluated. Some problems in the fabrication stemmed from the lamination and difficulties with the screen-printing, but a functioning plasma source was demonstrated.
Place, publisher, year, edition, pages
2015. Vol. 44, no 10, 3654-3660 p.
Ceramics Engineering and Technology Physical Sciences
Research subject Engineering Science with specialization in Microsystems Technology
IdentifiersURN: urn:nbn:se:uu:diva-251300DOI: 10.1007/s11664-015-3901-7ISI: 000360672900061OAI: oai:DiVA.org:uu-251300DiVA: diva2:805289
FunderSwedish National Space BoardKnut and Alice Wallenberg Foundation