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Investigation of the properties of thin films grown via sputtering and resistive thermal evaporation: an Ion Beam Analysis (IBA) study
Uppsala University, Disciplinary Domain of Science and Technology, Physics, Department of Physics and Astronomy, Applied Nuclear Physics.
2015 (English)Independent thesis Basic level (degree of Bachelor), 10 credits / 15 HE creditsStudent thesis
Abstract [en]

In this project, thin films are being manufactured by different methods in a thin film deposition set-up and subsequently characterized. This is done in order to determine if the set-up is capable of producing films of sufficient quality to be used for research purposes in the ion physics group of the division of applied nuclear physics at Uppsala University. Both copper and silver films are manufactured by magnetron sputtering deposition. Copper films are also manufactured by evaporation deposition. Deposition is made on Si(001) substrates. The films are analyzed with Rutherford Backscattering Spectrometry (RBS) and Time of Flight- Elastic Recoil Detection Analysis (ToF-ERDA). Results show that the deposition rate of the set-up is much faster compared to the one provided by the manufacturer of the set-up. The purity of the films i.e. the concentrations of the contaminants are found to be in an acceptable range for research applications with an average oxygen contamination of  and carbon contamination of  for sputtered copper films. Sputtered silver films were found to have an oxygen contamination of  and a carbon contamination of . Evaporated copper films were found to have an oxygen contamination of  and carbon contamination of . Traces of gold () were found exclusively in the sputtered films. Trace amounts of hydrogen could also be detected in both sputtered and evaporated films. The evaporated films are found to show lower contamination by oxygen than the sputtered films, but the manufacturing process employed in this study of evaporated films is not suitable to use for producing thin films of specific thicknesses as there is insufficient data to find a deposition speed. Overall, the set-up is capable of producing thin films with a sufficient quality for it to be used by the department when producing thin films for research.

Abstract [sv]

 I det här projektet produceras tunnfilmer med olika metoder i en uppställning för tunnfilmsdeposition och karaktäriseras sedan för att bedöma om maskinen är kapabel att producera filmer av tillräckligt bra kvalitet för att kunna användas i forskningssyften inom jonfysikgruppen på avdelningen för tillämpad kärnfysik på Uppsala Universitet. Både koppar och silverfilmer produceras med magnetronsputtring. Kopparfilmer produceras också med resistiv förångning. Deposition sker på Si(001)-substrat. Filmerna analyseras med Rutherford Backscattering Spectrometry (RBS) och Time of Flight- Elastic Recoil Detection Analysis (ToF-ERDA). Resultaten visar att depositionshastigheten för maskinen är snabbare än det som angetts av företaget som producerar maskinen. Renheten hos filmerna, dvs. koncentrationen av föroreningar, finnes vara inom en acceptabel nivå för forskningstillämpningar med en genomsnittlig syrekontamination på  och kolkontamination på  för sputtrade kopparfilmer. Sputtrade silverfilmer finnes ha en syrekontamination på  och en kolkontamination på . Förångade kopparfilmer finnes att ha en syrekontamination på  och en kolkontamination på . Spår av guld () hittades enbart i sputtrade filmer. Spår av väte kunde också hittas i både sputtrade och förångade filmer. De förångade filmerna finnes ha lägre syrekontamination än de sputtrade filmerna, men tillverkningsprocessen som används i projektet vid tillverkning av förångade filmer är inte lämplig att använda i produktion av tunnfilmer med specifika tjocklekar då det saknas data för att kunna hitta en depositionshastighet. Totalt sett är uppställningen kapabel att producera filmer av adekvat kvalitet för att de ska kunna användas inom avdelningen för produktion av filmer för forskning.

Place, publisher, year, edition, pages
2015. , 41 p.
Series
FYSAST, FYSKAND1045
Keyword [en]
Thin film, sputtering, evaporation, RBS, ERDA
National Category
Physical Sciences
Identifiers
URN: urn:nbn:se:uu:diva-257506OAI: oai:DiVA.org:uu-257506DiVA: diva2:839586
Educational program
Bachelor Programme in Physics
Supervisors
Examiners
Available from: 2015-07-03 Created: 2015-07-02 Last updated: 2015-07-03Bibliographically approved

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