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Arsenic distribution in Ti Si2/polycrystalline silicon bilayers during heat treatment
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
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1983 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 110, 289- p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
1983. Vol. 110, 289- p.
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Engineering and Technology
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URN: urn:nbn:se:uu:diva-257829OAI: oai:DiVA.org:uu-257829DiVA: diva2:840676
Available from: 2015-07-09 Created: 2015-07-09 Last updated: 2017-12-04

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