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Helium ion backscattering analysis employed to study surface damage and contamination of RF sputter etched silicon
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
1978 (English)In: Physica Scripta, ISSN 0031-8949, E-ISSN 1402-4896, Vol. 18, 400- p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
1978. Vol. 18, 400- p.
National Category
Engineering and Technology
URN: urn:nbn:se:uu:diva-257840OAI: oai:DiVA.org:uu-257840DiVA: diva2:840691
Available from: 2015-07-09 Created: 2015-07-09 Last updated: 2015-07-09

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