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Tantalum silicide films deposited by DC sputtering
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1981 (English)In: Journal of Electronic Materials, ISSN 0361-5235, E-ISSN 1543-186X, Vol. 19, p. 59-Article in journal (Refereed) Published
Place, publisher, year, edition, pages
1981. Vol. 19, p. 59-
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Engineering and Technology
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URN: urn:nbn:se:uu:diva-257945OAI: oai:DiVA.org:uu-257945DiVA, id: diva2:840884
Available from: 2015-07-09 Created: 2015-07-09 Last updated: 2017-12-04

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