uu.seUppsala University Publications
Change search
ReferencesLink to record
Permanent link

Direct link
Silicides of ruthenium and osmium: thin film reactions, diffusion, nucleation, stability
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
Show others and affiliations
1982 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 53, no 7Article in journal (Refereed) Published
Place, publisher, year, edition, pages
1982. Vol. 53, no 7
National Category
Engineering and Technology
URN: urn:nbn:se:uu:diva-257950OAI: oai:DiVA.org:uu-257950DiVA: diva2:840887
Available from: 2015-07-09 Created: 2015-07-09 Last updated: 2015-07-09

Open Access in DiVA

No full text

By organisation
Solid State Electronics
In the same journal
Journal of Applied Physics
Engineering and Technology

Search outside of DiVA

GoogleGoogle Scholar
The number of downloads is the sum of all downloads of full texts. It may include eg previous versions that are now no longer available

Total: 391 hits
ReferencesLink to record
Permanent link

Direct link