uu.seUppsala University Publications
Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Mass flow limitations in reactive sputtering
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
1985 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 130, 307-313 p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
1985. Vol. 130, 307-313 p.
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:uu:diva-258137OAI: oai:DiVA.org:uu-258137DiVA: diva2:841129
Available from: 2015-07-10 Created: 2015-07-10 Last updated: 2017-12-04

Open Access in DiVA

No full text

By organisation
Solid State Electronics
In the same journal
Thin Solid Films
Engineering and Technology

Search outside of DiVA

GoogleGoogle Scholar

urn-nbn

Altmetric score

urn-nbn
Total: 694 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • ieee
  • modern-language-association
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf