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Titanium silicide films prepared by reactive sputtering
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
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1984 (English)In: Journal of Vacuum Science & Technology B, ISSN 1071-1023, E-ISSN 1520-8567, Vol. 3, no 4, p. 997-Article in journal (Refereed) Published
Place, publisher, year, edition, pages
1984. Vol. 3, no 4, p. 997-
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Engineering and Technology
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URN: urn:nbn:se:uu:diva-258143OAI: oai:DiVA.org:uu-258143DiVA, id: diva2:841135
Available from: 2015-07-10 Created: 2015-07-10 Last updated: 2017-12-04

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