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A comparison of different methods for removal of damage caused by reactive sputter etching of silicon
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
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1986 (English)Conference paper (Refereed)
Place, publisher, year, edition, pages
1986. 116- p.
National Category
Engineering and Technology
URN: urn:nbn:se:uu:diva-258247OAI: oai:DiVA.org:uu-258247DiVA: diva2:841312
12th Nord Semiconductor Meeting, Norge
Available from: 2015-07-13 Created: 2015-07-13 Last updated: 2015-07-13

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