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Properties of titanium boride films prepared by reactive sputtering
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
1988 (English)In: Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, ISSN 0734-2101, E-ISSN 1520-8559, Vol. 6, no 3, 1693- p.Article in journal (Refereed) Published
Place, publisher, year, edition, pages
1988. Vol. 6, no 3, 1693- p.
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Engineering and Technology
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URN: urn:nbn:se:uu:diva-258275OAI: oai:DiVA.org:uu-258275DiVA: diva2:841363
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AVS-87
Available from: 2015-07-13 Created: 2015-07-13 Last updated: 2017-12-04

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