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Superhigh-rate plasma jet etching of silicon
Uppsala University, Disciplinary Domain of Science and Technology, Technology, Department of Engineering Sciences, Solid State Electronics.
1989 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 55, no 16, p. 1615-1617Article in journal (Refereed) Published
Place, publisher, year, edition, pages
1989. Vol. 55, no 16, p. 1615-1617
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Engineering and Technology
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URN: urn:nbn:se:uu:diva-258396OAI: oai:DiVA.org:uu-258396DiVA, id: diva2:841483
Available from: 2015-07-13 Created: 2015-07-13 Last updated: 2017-12-04

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